Quartz bath for sapphire substrate etching ACCUBATH® Xe
Quartz bus developed for wet etching of sapphire substrates; the industry's first high-temperature compatible product usable up to 300°C.
Accubath® Xe is designed for etching sapphire substrates, but we believe there are processes that can achieve higher throughput by operating at higher temperatures. The long processes due to the previous temperature limits of the baths may no longer be practical. This module enables processes at ultra-high temperatures that were previously impossible. We can build systems to tackle new challenges and provide them to our customers. By adopting the Accubath® Xe series baths, we are confident that you will be able to safely and reliably produce the processes you desire.
- Company：ヒロテック 東京営業所
- Price：Other
